Plasma Fundamentals

Name	Affiliation	Nationality	Presentaion title	Bio
Eugen Stamate	DTU Nanolab, Technical University of Denmark	Denmark	Understanding And Tuning The Target-Plasma-Substrate System During The Deposition Of Metal Oxide Thin Films By Magnetron Sputtering
Tiberiu Minea	University Paris-Saclay	France	Effect of surface phenomena on pulsed magnetron plasma and novel ways for power injection
Shota Nunomura	National Institute of Advanced Industrial Science and Technology(AIST)	Japan	Initial process of surface modification of silicon by rare-gas plasma processing
Takayuki Watanabe	Kyushu University	Japan	Determination Of Temperature And Density Of Lithium Vapor In Thermal Plasmas For Lithium-Ion Battery Materials

Coatings and Thin Films

Name	Affiliation	Nationality	Presentaion title	Bio
Yu-Lin Kuo	MNational Taiwan University of Science and Technology	Taiwan	Powering Surface Treatment of Engineering Materials by Atmospheric Pressure Plasma for Nitrogen Doping/Nitriding
Jyh-Ming Wu	National Tsing Hua University	Taiwan	2D Materials Piezocatalysts: Energy and Environmental Remediations
Matjaz Godec	Institute Of Metals And Technology	Slovenia	Plasma Nitriding of Metal Materials Produced by Powder Bed Fusion for Improved Tribological and Corrosion Performance
Dermot Monaghan	Gencoa Ltd.	United Kingdom	From highly ionised vapour to fusion reactor control, how Vacuum Plasma Technology is meeting the demands of industry
Pung Keun Song	Pusan National University	Korea	Performance Of Wide Gap Semiconductor Using Hybrid Structure
Ralf Bandorf	Fraunhofer Institute for Surface Engineering and Thin Films IST	Germany	Challenges and Impact of Reactive HIPIMS for Future Industrial Processes
Mineo Hiramatsu	Meijo University	Japan	Synthesis and Functionalization of 3D Graphene-Based Materials
Petr Vasina	Masaryk University	Czech Republic	Exploring Ionized Metal Flux Fraction in Magnetron Sputtering: Insights from Laboratory and Industrial Applications
Phitsanu Poolcharuansin	Mahasarakham University	Thailand	Energy Distribution of Negative Ions in Reactive Magnetron Sputtering

Energy and Environment

Name	Affiliation	Nationality	Presentaion title	Bio
Naoki Shirai	Hokkai University	Japan	Generation of energy carriers by atmospheric pressure plasma-induced electrolysis
Makoto Kambara	Osaka University	Japan	Novel Closed Loop Of Aluminum Alloy Powders For Metal Additive Manufacturing By Mesoplasma Rejuvenation
G. van Rooij	Maastricht University	Netherlands	Plasma Chemistry for the Energy and Materials Transition of the Process Industry
Yong Sup CHOI	Korea Institute of Fusion Energy	Korea	Plasma Technology Research at KFE-IPT for a Sustainable Future
Zdenko Machala	Comenius University Bratislava	Slovakia	Purification of indoor air by non-thermal DBD plasma combined with photocatalysis
Karol Hensel	Comenius University Bratislava	Slovakia	Honeycomb Discharge – Its Physical Properties and Chemical Potential for Environmental Applications
Rony Snyders	Université de Mons	Belgium	Experimental Study of Hydrocarbons Pyrolysis in a Planar Atmospheric Gliding Arc Discharge
Satyananda Kar	ndian Institute of Technology Delhi	India	Graphite Electrode-based Plasma Gasification for Municipal Solid Waste Treatment

Bio, Medicine and Agriculture

Name	Affiliation	Nationality	Presentaion title	Bio
Koichi Takaki	Iwate University	Japan	Function of high-voltage stimulation on fruiting body formation of Basidiomycota
Augusto Stancampiano	University of Orleans	France	Cold plasma and Artificial Intelligence: a new technique for the classification of biological tissue
Clara Tran	The University of Sydney	Australia	Radical-rich surfaces via Plasma treatments: Enabling innovations in Biomedical and Biotech applications
Marian Lehocky	Tomas Bata University in Zlín	Czech Republic	Plasma Polymerization of Recycled PLA Esters: A Green Strategy for Functional and Antibacterial Surface Coatings

Materials and Functional Surface Treatment

Name	Affiliation	Nationality	Presentaion title	Bio
Hiroki Kondo	Kyushu University	Japan	Informatics-assisted analysis and control of film quality development in plasma-enhanced CVD
Hakaru Mizoguchi	Kyushu University	Japan	Plasma Dynamics And Future Of LPP-EUV Source For Semiconductor Manufacturing
Sven Ulrich	KIT Karlsruhe	Germany	Constitution, micro structure and properties of carbon-based nanocomposites produced by DCMS/HiPIMS hybrid deposition technology

Plasma DX and AI

Name	Affiliation	Nationality	Presentaion title	Bio
Heeyeop Chae	Sungkyunkwan University	Korea	Plasma-Based Atomic Layer Etching For Semiconductor Device Fabrication
Kristaq GAZELI	University Sorbonne Paris Nord	France	MICROHOLLOW CATHODE DISCHARGES FOR THE SYNTHESIS OF HEXAGONAL BORON NITRIDE: IN-SITU PLASMA DIAGNOSTICS AND MATERIAL CHARACTERIZATION
Masayuki YOKOYAMA	National Institute for Fusion Science	Japan	Progress of Statistical-Mathematical Fusion (Plasma) Research
Kenji Ishikawa	Nagoya University	Japan	Recent Advances In Plasma Processing For Leading-edge Semiconductor Fabrication

Characterization and Analysis

Name	Affiliation	Nationality	Presentaion title	Bio
Jwasoon Kim	HB Solution	Korea	Quantitative and high-resolution depth profiling of thin films and hydrogen by TOF-MEIS